Back to Search
Start Over
Time dependent plasma properties during microarcing in radio frequency plasmas.
- Source :
-
Applied Physics Letters . 11/5/2007, Vol. 91 Issue 19, p191501. 3p. 1 Diagram, 4 Graphs. - Publication Year :
- 2007
-
Abstract
- We report experimental results for time dependent plasma properties during microarcing in a rf plasma system. A cutoff discriminator bias voltage can be defined as a parameter representing plasma potential. The cutoff voltage during the microarcing does not exactly follow the dependence of floating potential. The plasma/ion density increases significantly after microarc initiation and then reduces slowly. We propose that a significant number of electrons enter the plasma in the initial period of the microarc and gain very high energy. These high energy electrons lose their energy through a relatively slower process of collisions while generating a significantly higher plasma density. [ABSTRACT FROM AUTHOR]
- Subjects :
- *PLASMA gases
*PLASMA density
*ELECTRONS
*ELECTRODES
*ELECTRIC discharges
Subjects
Details
- Language :
- English
- ISSN :
- 00036951
- Volume :
- 91
- Issue :
- 19
- Database :
- Academic Search Index
- Journal :
- Applied Physics Letters
- Publication Type :
- Academic Journal
- Accession number :
- 27546538
- Full Text :
- https://doi.org/10.1063/1.2806186