Influence of sputter oxygen partial pressure on photoelectrochemical performance of tungsten oxide films

Abstract: Polycrystalline tungsten oxide films of 1–1.2μm thickness were prepared by reactive sputtering at elevated substrate temperature (270°C) and under different oxygen partial pressures in the range from 0.8 to 2.1mTorr. At the lowest partial pressure the films were substoichiometric, showed increased disorder, and exhibited photocurrents of 0.6mA/cm2 at 1.8V vs SCE in 0.33M H3PO4. At partial pressures of 1.4mTorr and greater, stoichiometric WO3 films were produced which exhibited photocurrents of 2.4mA/cm2 at 1.8V vs SCE. It has been determined that the photoelectrochemical performance of slightly substoichiometric films is adversely affected by changes in optical properties, while the photocurrents of severely substoichiometric films suffer additionally from poor carrier collection. [Copyright &y& Elsevier]