Back to Search
Start Over
Integrated dynamic simulation of rapid thermal chemical vapor deposition of polysilicon.
- Source :
-
IEEE Transactions on Semiconductor Manufacturing . Feb98, Vol. 11 Issue 1, p63. 12p. 3 Black and White Photographs, 4 Diagrams, 1 Chart, 6 Graphs. - Publication Year :
- 1998
-
Abstract
- Presents information pertaining to the rapid thermal chemical vapor deposition (RTCVD) of polysilicon. Information on the capacity of the simulator; What role the computer simulation plays; Basis of the mathematical models for equipment and materials processes.
- Subjects :
- *RAPID thermal processing
Subjects
Details
- Language :
- English
- ISSN :
- 08946507
- Volume :
- 11
- Issue :
- 1
- Database :
- Academic Search Index
- Journal :
- IEEE Transactions on Semiconductor Manufacturing
- Publication Type :
- Academic Journal
- Accession number :
- 244754
- Full Text :
- https://doi.org/10.1109/66.661286