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Ar+ irradiation of Si nanocrystal-doped SiO2: Evolution of photoluminescence

Authors :
Xie, Zhi-Qiang
Li, Zheng-Hao
Fan, Wen-Bin
Chen, Dan
Zhao, You-Yuan
Lu, Ming
Source :
Applied Surface Science. Apr2007, Vol. 253 Issue 12, p5501-5505. 5p.
Publication Year :
2007

Abstract

Abstract: We report the evolution of photoluminescence (PL) of Si nanocrystals (nc-Si) embedded in a matrix of SiO2 during Ar+ ion bombardment. The integrated intensity of nc-Si PL falls down drastically before the Ar+ ion fluence of 1015 ionscm−2, and then decreases slowly with the increasing ion fluence. At the meantime, the PL peak position blueshifts steadily before the fluence of 1015 ionscm−2, and then changes in an oscillatory manner. Also it is found that the nc-Si PL of the Ar+-irradiated sample can be partly recovered after annealing at 800°C in nitrogen, but can be almost totally recovered after annealing in oxygen. The results confirm that the ion irradiation-induced defects are made up of oxygen vacancies, which absorb light strongly. The oscillatory peak shift of nc-Si can be related to a size-distance distribution of nc-Si in SiO2. [Copyright &y& Elsevier]

Details

Language :
English
ISSN :
01694332
Volume :
253
Issue :
12
Database :
Academic Search Index
Journal :
Applied Surface Science
Publication Type :
Academic Journal
Accession number :
24299208
Full Text :
https://doi.org/10.1016/j.apsusc.2006.12.031