Characteristics of HfOxNy thin films by rf reactive sputtering at different deposition temperatures.

MLA

Liu, M., et al. “Characteristics of HfOxNy Thin Films by Rf Reactive Sputtering at Different Deposition Temperatures.” Journal of Applied Physics, vol. 101, no. 3, Feb. 2007, p. 034107–N.PAG. EBSCOhost, https://doi.org/10.1063/1.2432379.

APA

Liu, M., Fang, Q., He, G., Zhu, L. Q., & Zhang, L. D. (2007). Characteristics of HfOxNy thin films by rf reactive sputtering at different deposition temperatures. Journal of Applied Physics, 101(3), 034107–N.PAG. https://doi.org/10.1063/1.2432379

Chicago

Liu, M., Q. Fang, G. He, L. Q. Zhu, and L. D. Zhang. 2007. “Characteristics of HfOxNy Thin Films by Rf Reactive Sputtering at Different Deposition Temperatures.” Journal of Applied Physics 101 (3): 034107–N.PAG. doi:10.1063/1.2432379.