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Analysis of defects in epitaxial oxide thin films via X-ray diffraction technology
- Source :
-
Thin Solid Films . Feb2007, Vol. 515 Issue 7/8, p3530-3538. 9p. - Publication Year :
- 2007
-
Abstract
- Abstract: It is demonstrated that a careful X-ray diffraction analysis represents an effective way to determine imperfections and their density in complex oxide epitaxial thin films. A method for simulating X-ray intensities of the (00ℓ) reflexes is developed and demonstrated for the model system YBa2Cu3O7−δ . In a first step, the δ dependence of the intensities of the different (00ℓ) reflexes is simulated and compared to literature data of perfect YBa2Cu3O7−δ thin film and bulk samples with different oxygen content. In a second step, it is demonstrated that the δ dependence of the intensities of the different (00ℓ) reflexes depends strongly on the type of defects in case of imperfect YBa2Cu3O7−δ . Different types of defects (e.g., cation disorder, cation substitution, Cu deficiency) are discussed. Finally, the method is applied to low-pressure sputtered YBa2Cu3O7−δ thin film. It is shown that according to this analysis and in contrast to previous assumptions, Cu(1) deficiency seems to be responsible for the elongation of the c-axis and the reduction of the superconducting transition temperature. [Copyright &y& Elsevier]
- Subjects :
- *OXIDE coating
*EPITAXY
*X-ray diffraction
*SCREEN-film radiography
Subjects
Details
- Language :
- English
- ISSN :
- 00406090
- Volume :
- 515
- Issue :
- 7/8
- Database :
- Academic Search Index
- Journal :
- Thin Solid Films
- Publication Type :
- Academic Journal
- Accession number :
- 24045836
- Full Text :
- https://doi.org/10.1016/j.tsf.2006.10.134