Passivation effect on the liquid crystal alignment on a-C:H films: A two-step treatment by argon and hydrogen plasma beam scanning.

MLA

Wu, K. Y., et al. “Passivation Effect on the Liquid Crystal Alignment on A-C:H Films: A Two-Step Treatment by Argon and Hydrogen Plasma Beam Scanning.” Journal of Applied Physics, vol. 101, no. 2, Jan. 2007, p. 023531–N.PAG. EBSCOhost, https://doi.org/10.1063/1.2432044.

APA

Wu, K. Y., Chang, S. J., Hwang, J., Lee, C.-Y., Tang, H.-C., Chen, C.-W., Liu, C. H., Wei, H. K., Kou, C. S., & Lee, C.-D. (2007). Passivation effect on the liquid crystal alignment on a-C:H films: A two-step treatment by argon and hydrogen plasma beam scanning. Journal of Applied Physics, 101(2), 023531–N.PAG. https://doi.org/10.1063/1.2432044

Chicago

Wu, K. Y., S. J. Chang, J. Hwang, C.-Y. Lee, H.-C. Tang, C.-W. Chen, C. H. Liu, H. K. Wei, C. S. Kou, and C.-D. Lee. 2007. “Passivation Effect on the Liquid Crystal Alignment on A-C:H Films: A Two-Step Treatment by Argon and Hydrogen Plasma Beam Scanning.” Journal of Applied Physics 101 (2): 023531–N.PAG. doi:10.1063/1.2432044.