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Epitaxial lateral overgrowth of Al x Ga1− x N (x>0.2) on sapphire and its application to UV-B-light-emitting devices

Authors :
Iida, Kazuyoshi
Kawashima, Takeshi
Iwaya, Motoaki
Kamiyama, Satoshi
Amano, Hiroshi
Akasaki, Isamu
Bandoh, Akira
Source :
Journal of Crystal Growth. Jan2007, Vol. 298, p265-267. 3p.
Publication Year :
2007

Abstract

Abstract: Crack-free and low-dislocation-density Al x Ga1− x N with x higher than 0.2 was successfully grown on a grooved AlN template prepared on a sapphire substrate. Efficient UV-B-light-emitting diodes can be fabricated on such an AlGaN layer. [Copyright &y& Elsevier]

Details

Language :
English
ISSN :
00220248
Volume :
298
Database :
Academic Search Index
Journal :
Journal of Crystal Growth
Publication Type :
Academic Journal
Accession number :
23823906
Full Text :
https://doi.org/10.1016/j.jcrysgro.2006.10.026