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30-nm-wide aluminum nanowire grid for ultrahigh contrast and transmittance polarizers made by UV-nanoimprint lithography.
- Source :
-
Applied Physics Letters . 10/2/2006, Vol. 89 Issue 14, p141105. 3p. 1 Black and White Photograph, 1 Diagram, 3 Graphs. - Publication Year :
- 2006
-
Abstract
- Both high contrast and high transmittance are preferred for optical polarizers. To achieve high transmittance for aluminum nanowire-grid polarizers, a narrow linewidth is required. In this letter, aluminum nanowire-grid polarizers with 30-nm-wide linewidth and 200 nm depth were fabricated by UV-nanoimprint lithography, which leads to ultrahigh transmittance. To achieve a high contrast, the authors fabricated the 30-nm-wide aluminum nanowire structures on both sides of the glass wafers. An extremely high contrast up to 10 000:1 was achieved, in the visible range, along with good transmittance of 83%–87% for the double-side aluminum nanowire-grid polarizers. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 00036951
- Volume :
- 89
- Issue :
- 14
- Database :
- Academic Search Index
- Journal :
- Applied Physics Letters
- Publication Type :
- Academic Journal
- Accession number :
- 22752230
- Full Text :
- https://doi.org/10.1063/1.2358813