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Manipulating Ge quantum dots on ultrathin Si x Ge1−x oxide films using scanning tunneling microscope tips

Authors :
Nakamura, Yoshiaki
Takata, Hiroyuki
Masada, Akiko
Ichikawa, Masakazu
Source :
Surface Science. Sep2006, Vol. 600 Issue 17, p3456-3460. 5p.
Publication Year :
2006

Abstract

Abstract: Germanium quantum dots (QDs) were extracted from ultrathin Si x Ge1−x oxide films using scanning tunneling microscope (STM) tips. The extraction was most efficiently performed at a positive sample bias voltage of +5.0V. The tunneling current dependence of the extraction efficiency was explained by the electric field evaporation transfer mechanism for positive Ge ions from QDs to STM tips. Ge QDs (∼7nm) were formed and isolated spatially by extracting the surrounding Ge QDs with an ultrahigh density of >1012 cm−2. Scanning tunneling spectroscopy of the spatially-isolated QDs revealed that QDs with an ultrahigh density are electrically-isolated from the adjacent dots. [Copyright &y& Elsevier]

Details

Language :
English
ISSN :
00396028
Volume :
600
Issue :
17
Database :
Academic Search Index
Journal :
Surface Science
Publication Type :
Academic Journal
Accession number :
22278674
Full Text :
https://doi.org/10.1016/j.susc.2006.06.035