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Formation of ultrahigh density and ultrasmall coherent β-FeSi2 nanodots on Si (111) substrates using Si and Fe codeposition method.
- Source :
-
Journal of Applied Physics . 8/15/2006, Vol. 100 Issue 4, p044313-N.PAG. 5p. 4 Black and White Photographs, 1 Chart, 4 Graphs. - Publication Year :
- 2006
-
Abstract
- We studied the formation of β-FeSi2 nanodots by codeposition at disilicide stoichiometric deposition rates of Fe and Si on Si (111) substrates covered with ultrathin SiO2 films. Hemispherical β-FeSi2 nanodots with an ultrahigh density (>1012 cm-2) and with a narrow size distribution at the average size of ∼5 nm diameter were epitaxially grown by the codeposition at 500 °C on ultrathin SiO2 films with predeposited Si. High-resolution transmission electron microscope observations showed that the formed nanodots were strained with a main configuration of β-FeSi2 (110)/Si (111). We propose the formation mechanism that a reaction between the SiO2 films and deposited Si atoms formed voids in the SiO2 films to work as nucleation sites, followed by direct β-FeSi2 formation from Fe and Si without passing through other iron silicide phases. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 100
- Issue :
- 4
- Database :
- Academic Search Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 22257293
- Full Text :
- https://doi.org/10.1063/1.2266322