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Application of various optical techniques for ESD defect localization

Authors :
Essely, F.
Darracq, F.
Pouget, V.
Remmach, M.
Beaudoin, F.
Guitard, N.
Bafleur, M.
Perdu, P.
Touboul, A.
Lewis, D.
Source :
Microelectronics Reliability. Sep2006, Vol. 46 Issue 9-11, p1563-1568. 6p.
Publication Year :
2006

Abstract

Abstract: Various optical defect localization techniques are applied on the same integrated circuits (IC). These circuits were previously stressed by Electro Static Discharges (ESD) to create defects. The results obtained by each technique were analyzed to determine the nature of the defects. The different data are compared to assess their sensitivity and to evaluate the contribution of each technique in a failure analysis flow. [Copyright &y& Elsevier]

Details

Language :
English
ISSN :
00262714
Volume :
46
Issue :
9-11
Database :
Academic Search Index
Journal :
Microelectronics Reliability
Publication Type :
Academic Journal
Accession number :
22135767
Full Text :
https://doi.org/10.1016/j.microrel.2006.07.021