Back to Search
Start Over
High-intensity Si cluster ion emission from a silicon target bombarded with large Ar cluster ions
- Source :
-
Applied Surface Science . Jul2006, Vol. 252 Issue 19, p6550-6553. 4p. - Publication Year :
- 2006
-
Abstract
- Abstract: Secondary ions emitted from Si targets were measured with a quadrupole mass spectrometer under large Ar cluster and monomer ion bombardment. Incident ion beams with energies from 7.5 to 25keV were used and the mean size of the Ar cluster ion was about 1000atoms/cluster. Si n + ions with n values up to n =8 were detected under Ar cluster ion bombardment, whereas Si cluster ions were scarcely detected under Ar monomer ion bombardment. These cluster ion yields showed the power law dependence on the cluster size. [Copyright &y& Elsevier]
- Subjects :
- *SECONDARY ion emission
*ION bombardment
*IONS
*SILICON
Subjects
Details
- Language :
- English
- ISSN :
- 01694332
- Volume :
- 252
- Issue :
- 19
- Database :
- Academic Search Index
- Journal :
- Applied Surface Science
- Publication Type :
- Academic Journal
- Accession number :
- 22009573
- Full Text :
- https://doi.org/10.1016/j.apsusc.2006.02.100