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Effects of various nitriding parameters on active screen plasma nitriding behavior of a low-alloy steel

Authors :
Ahangarani, Sh.
Mahboubi, F.
Sabour, A.R.
Source :
Vacuum. Jun2006, Vol. 80 Issue 9, p1032-1037. 6p.
Publication Year :
2006

Abstract

Abstract: Active screen plasma nitriding (ASPN) is a novel surface modification technique that has many capabilities over the conventional DC plasma nitriding (CPN). In this study, 30CrNiMo8 low-alloy steel was active screen plasma-nitrided under various nitriding parameters such as active screen set-up parameters (different screen hole sizes, mesh sheet and plate top lids) and treatment temperature (520, 550 and 580°C), in the gas mixture of 75% N2+25% H2 and chamber pressure of 500Pa for 5h. The properties of the nitrided specimens have been assessed by evaluating composition of phases, surface hardness, compound layer thickness and case depth using X-ray diffraction (XRD), microhardness measurements and scanning electron microscopy (SEM). It was found that the screen hole size and top lid type (mesh or plate) play an important role in transition of active species (nitrogen ions and neutrals) toward the sample surface, which in turn can affect the nitrided layer hardness and thickness. Treatment at higher temperature with bigger screen hole size resulted in a thicker compound layer and higher layer hardness. The compound layers developed on the samples treated under different conditions were dual phase consisting of γ′-Fe4N and ε-Fe2–3N phases. [Copyright &y& Elsevier]

Details

Language :
English
ISSN :
0042207X
Volume :
80
Issue :
9
Database :
Academic Search Index
Journal :
Vacuum
Publication Type :
Academic Journal
Accession number :
21048863
Full Text :
https://doi.org/10.1016/j.vacuum.2006.01.013