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Comparison of valence band x-ray photoelectron spectrum between Al–N-codoped and N-doped ZnO films.

Authors :
Cong, G. W.
Peng, W. Q.
Wei, H. Y.
Han, X. X.
Wu, J. J.
Liu, X. L.
Zhu, Q. S.
Wang, Z. G.
Lu, J. G.
Ye, Z. Z.
Zhu, L. P.
Qian, H. J.
Su, R.
Hong, C. H.
Zhong, J.
Ibrahim, K.
Hu, T. D.
Source :
Applied Physics Letters. 2/6/2006, Vol. 88 Issue 6, p062110. 3p. 1 Chart, 3 Graphs.
Publication Year :
2006

Abstract

The valence band structures of Al–N-codoped [ZnO:(Al, N)] and N-doped (ZnO:N) ZnO films were studied by normal and soft x-ray photoelectron spectroscopy. The valence-band maximum of ZnO:(Al, N) shifts up to Fermi energy level by about 300 meV compared with that of ZnO:N. Such a shift can be attributed to the existence of a kind of Al–N in ZnO:(Al, N), as supported by core level XPS spectra and comparison of modified Auger parameters. Al–N increased the relative quantity of Zn–N in ZnO:(Al, N), while N–N decreased that of Zn–N in ZnO:N. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00036951
Volume :
88
Issue :
6
Database :
Academic Search Index
Journal :
Applied Physics Letters
Publication Type :
Academic Journal
Accession number :
19933704
Full Text :
https://doi.org/10.1063/1.2171804