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Nanoimprint lithography: the semiconductor industry and beyond.

Authors :
Luesebrink, Helge
Source :
Microlithography World. Feb2006, Vol. 15 Issue 1, p4-18. 4p. 3 Diagrams, 2 Charts, 1 Graph.
Publication Year :
2006

Abstract

Various versions of nanoimprint lithography have the potential to supercede optical patterning methods in many applications, if a few difficulties can be overcome. [ABSTRACT FROM AUTHOR]

Subjects

Subjects :
*MICROLITHOGRAPHY
*LITHOGRAPHY
*METHODOLOGY
*PRINTS
*PRINTING

Details

Language :
English
ISSN :
1074407X
Volume :
15
Issue :
1
Database :
Academic Search Index
Journal :
Microlithography World
Publication Type :
Periodical
Accession number :
19833605

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Authors Abstract Subjects Details