Dual threshold voltages and power-gating design flows offer good results.

The article explains the advantages of a dual threshold voltages and power-gating design flows to very-deep-submicron chips. The dual-voltages approach and power-gating design flows can achieve excellent results for both power and timing with a high degree of automation. It manages both leakage power and performance of electronic circuitry with little effort. The dual voltage methodologies rely on the use of low-voltage cells that have smaller propagation delay and higher leakage power and the use of higher voltage cells that have larger delay and lower leakage.