Cite
Growth kinetics study in halide chemical vapor deposition of SiC
MLA
Nigam, S., et al. “Growth Kinetics Study in Halide Chemical Vapor Deposition of SiC.” Journal of Crystal Growth, vol. 284, no. 1/2, Oct. 2005, pp. 112–22. EBSCOhost, https://doi.org/10.1016/j.jcrysgro.2005.06.027.
APA
Nigam, S., Chung, H. J., Polyakov, A. Y., Fanton, M. A., Weiland, B. E., Snyder, D. W., & Skowronski, M. (2005). Growth kinetics study in halide chemical vapor deposition of SiC. Journal of Crystal Growth, 284(1/2), 112–122. https://doi.org/10.1016/j.jcrysgro.2005.06.027
Chicago
Nigam, S., H.J. Chung, A.Y. Polyakov, M.A. Fanton, B.E. Weiland, D.W. Snyder, and M. Skowronski. 2005. “Growth Kinetics Study in Halide Chemical Vapor Deposition of SiC.” Journal of Crystal Growth 284 (1/2): 112–22. doi:10.1016/j.jcrysgro.2005.06.027.