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The solubility of phosphorus in GaN

Authors :
Wu, X.S.
Zhai, Z.Y.
Fan, Y.H.
Chen, D.J.
Shen, B.
Zhang, R.
Zheng, Y.D.
Jiang, S.S.
Source :
Applied Surface Science. Aug2005, Vol. 250 Issue 1-4, p182-187. 6p.
Publication Year :
2005

Abstract

Abstract: IIIV x N1−x ternary alloys are promising materials for their applications in light-emitting devices in the range of wavelength from ultra violet to the infrared ray due to the large bowing of band gap energy. In this paper, molecular dynamical method was used to calculate the solubility of phosphorus in GaN by using the Gibbs free energy and the dielectric theory. The calculation results show that the content of P in GaN varies with the growth temperature, which may be larger than 25% in the N-rich GaP x N1−x or less than 90% in the P-rich GaP x N1−x , at the growth temperature of about 1500K. We compared our theoretical results with those reported in references. By using light-radiation heating together with low-pressure metal-organic chemical vapor deposition, and ion implantation techniques, we have successfully synthesized N-rich (x <0.17) and P-rich GaP x N1−x (x >0.90) compounds. [Copyright &y& Elsevier]

Details

Language :
English
ISSN :
01694332
Volume :
250
Issue :
1-4
Database :
Academic Search Index
Journal :
Applied Surface Science
Publication Type :
Academic Journal
Accession number :
18232728
Full Text :
https://doi.org/10.1016/j.apsusc.2004.12.046