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Crystal structure characterization of ion-beam-synthesized Co...Y...Si... silicide.

Authors :
Wu, M.F.
Hogg, S.
Source :
Journal of Applied Physics. 5/1/1999, Vol. 85 Issue 9, p6929. 3p. 3 Graphs.
Publication Year :
1999

Abstract

Presents information on a study of heteroepitaxial ternary cobalt(Co)...yttrium(Y)...silicon(Si)... silicide formed by Co implantation into YSi...Si. Use of metal silicides in microelectronics; Application of Rutherford backscattering; Use of x-ray diffraction to determine compounds present in the sample.

Details

Language :
English
ISSN :
00218979
Volume :
85
Issue :
9
Database :
Academic Search Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
1815924
Full Text :
https://doi.org/10.1063/1.370108