POSITIVELY CHARGED MICROPARTICLE IN PLASMA WITH HIGH-ENERGY ELECTRON BEAM.

The processes of recharging, heating and evaporation of a positively charged microparticle (MP) introduced into the plasma with an injected high-energy electron beam are considered. It is assumed that the MP is charged outside the plasma and then introduced into the plasma by an accelerating field, where plasma and beam electrons hitting the MP heat and evaporate it. In addition to introducing the MP into the plasma, the positive MP charge provides an additional source of energy needed to heat and evaporate it. Using the OML theory, the system of current and energy balance equations was numerically solved and the conditions, under which the MP is heated to the boiling point of its substance, resulting in its intense evaporation, were determined. The influence of the energy of the electron beam on the process of MP recharging, as well as on the rate of its heating and evaporation, has been studied. An estimate of the particle entry velocity into the plasma has been made; the distances at which its recharging, heating to the boiling point and complete evaporation occur are determined. The work is carried out in order to creating plasma of a given elemental composition. [ABSTRACT FROM AUTHOR]