Electron scattering cross sectional data for precursors used in plasma-assisted deposition.

In this study, a comprehensive electron scattering analysis is performed on the precursors AlF 3 and AlCl 3 used in the plasma-assisted deposition technique. We used the R-matrix and spherical complex optical potential formalisms to calculate the integral elastic cross sections for electron energies between 0.1 and 5000 eV. At low energies, we computed differential and integral elastic cross sections and excitation cross sections using the R-matrix method. We have also reported the ionization cross section using the complex scattering potential-ionization contribution method and the binary-encounter-Bethe method. Our computed results show overall good agreement with the available data in the literature. [ABSTRACT FROM AUTHOR]