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High-resolution stereolithography: Negative spaces enabled by control of fluid mechanics.

Authors :
Coates, Ian A.
Pan, William
Saccone, Max A.
Lipkowitz, Gabriel
Ilyin, Dan
Driskill, Madison M.
Dulay, Maria T.
Frank, Curtis W.
Shaqfeh, Eric S. G.
DeSimone, Joseph M.
Source :
Proceedings of the National Academy of Sciences of the United States of America. 9/10/2024, Vol. 121 Issue 37, p1-6. 17p.
Publication Year :
2024

Abstract

Stereolithography enables the fabrication of three-dimensional (3D) freeform structures via light-induced polymerization. However, the accumulation of ultraviolet dose within resin trapped in negative spaces, such as microfluidic channels or voids, can result in the unintended closing, referred to as overcuring, of these negative spaces. We report the use of injection continuous liquid interface production to continuously displace resin at risk of overcuring in negative spaces created in previous layers with fresh resin to mitigate the loss of Z-axis resolution. We demonstrate the ability to resolve 50-µm microchannels, breaking the historical relationship between resin properties and negative space resolution. With this approach, we fabricated proof-of-concept 3D free-form microfluidic devices with improved design freedom over device material selection and resulting properties. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00278424
Volume :
121
Issue :
37
Database :
Academic Search Index
Journal :
Proceedings of the National Academy of Sciences of the United States of America
Publication Type :
Academic Journal
Accession number :
179698042
Full Text :
https://doi.org/10.1073/pnas.2405382121