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Vacuum‐ultraviolet‐photoionization chamber for the investigation of ion‐based surface treatment and thin film deposition at atmospheric pressure.
- Source :
-
Plasma Processes & Polymers . Sep2024, Vol. 21 Issue 9, p1-13. 13p. - Publication Year :
- 2024
-
Abstract
- The vacuum‐ultraviolet‐photoionization chamber was constructed to allow controlled ion generation and well‐defined surface treatment with these ions at atmospheric pressure. It utilizes atmospheric helium plasma as a photon source and separates the ion generation from the plasma by an aerodynamic window. The ions are guided to the grounded substrate by a weak electric field, while the diffusive transport of neutrals is reduced by a helium gas flow along the substrate. Ionic species and the absolute ion flux were determined in the substrate region. Ion‐based thin film deposition using a C2H2 ${{\rm{C}}}_{2}{{\rm{H}}}_{2}$ precursor was investigated as a model process. The proposed system enables future investigation of e.g. the isolated interaction of ions with biological substrates. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 16128850
- Volume :
- 21
- Issue :
- 9
- Database :
- Academic Search Index
- Journal :
- Plasma Processes & Polymers
- Publication Type :
- Academic Journal
- Accession number :
- 179411873
- Full Text :
- https://doi.org/10.1002/ppap.202400103