Back to Search Start Over

Exploration of the mechanism of levofloxacin removal by N-doped-induced interfacial micro-electric field-activated persulfate.

Authors :
Sun, Pengxin
Han, Biao
Yu, Zebin
Yao, Shuangquan
Liu, Jing
Jiang, Ronghua
Huang, Jun
Hou, Yanping
Zhang, Boge
Li, Mingjie
Mo, Rongli
Source :
Journal of Colloid & Interface Science. Dec2024, Vol. 675, p36-51. 16p.
Publication Year :
2024

Abstract

[Display omitted] The defects formed by N doping always coexist with pyrrole nitrogen (Po) and pyridine nitrogen (Pd), and the synergistic mechanisms of H 2 O 2 production and PMS activation between the different Po: Pd are unknown. This paper synthesized MOF-derived carbon materials with different nitrogen-type ratios as cathode materials in an electro-Fenton system using precursors with different nitrogen-containing functional groups. Several catalysts with different Po: Pd ratios (0:4, 1:3, 2:2, 3:1, 4:0) were prepared, and the best catalyst for LEV degradation was FC-CN (Po: Pd=3:1). X-ray Photoelectron Spectroscopy (XPS) and density-functional theory (DFT) calculations show that the introduction of nitrogen creates an interfacial micro-electric field (IMEF) in the carbon layer and the metal, accelerates the electron transfer from the carbon layer to the Co atoms, and promotes cycling between the Fe3+/Co2+ redox pairs, with the electron transfer reaching a maximum at Po: Pd = 3:1. FC-CN (Po: Pd=3:1) achieved more than 95 % LEV degradation in 90 min at pH = 3–9, with a lower energy consumption of 0.11 kWh m−3 order−1. and the energy consumption of the catalyst for LEV degradation is lower than that of those catalysts reported. In addition, the degradation pathway of LEV was proposed based on UPLC-MS and Fukui function. This study offers some valuable information for the application of MOF derivatives. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00219797
Volume :
675
Database :
Academic Search Index
Journal :
Journal of Colloid & Interface Science
Publication Type :
Academic Journal
Accession number :
179396226
Full Text :
https://doi.org/10.1016/j.jcis.2024.06.236