Plasma-enhanced atomic layer deposition as a technique for controlling the composition and properties of indium-based transparent conductive oxides.

MLA

Zered, Matanel, et al. “Plasma-Enhanced Atomic Layer Deposition as a Technique for Controlling the Composition and Properties of Indium-Based Transparent Conductive Oxides.” Journal of Applied Physics, vol. 136, no. 8, Aug. 2024, pp. 1–11. EBSCOhost, https://doi.org/10.1063/5.0217534.

APA

Zered, M., Korchnoy, V., Frey, G. L., & Eizenberg, M. (2024). Plasma-enhanced atomic layer deposition as a technique for controlling the composition and properties of indium-based transparent conductive oxides. Journal of Applied Physics, 136(8), 1–11. https://doi.org/10.1063/5.0217534

Chicago

Zered, Matanel, Valentina Korchnoy, Gitti L. Frey, and Moshe Eizenberg. 2024. “Plasma-Enhanced Atomic Layer Deposition as a Technique for Controlling the Composition and Properties of Indium-Based Transparent Conductive Oxides.” Journal of Applied Physics 136 (8): 1–11. doi:10.1063/5.0217534.