Wide-field pattern-inspection system cuts microscopy scan time.

MLA

Yamamoto, Masahiro, et al. “Wide-Field Pattern-Inspection System Cuts Microscopy Scan Time.” Solid State Technology, vol. 48, no. 8, Aug. 2005, p. 20. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=asx&AN=17926209&authtype=sso&custid=ns315887.

APA

Yamamoto, M., Kitamura, T., & Inoue, M. (2005). Wide-field pattern-inspection system cuts microscopy scan time. Solid State Technology, 48(8), 20.

Chicago

Yamamoto, Masahiro, Tadashi Kitamura, and M. Inoue. 2005. “Wide-Field Pattern-Inspection System Cuts Microscopy Scan Time.” Solid State Technology 48 (8): 20. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=asx&AN=17926209&authtype=sso&custid=ns315887.