Prediction of ceramic stereolithography resin sensitivity from theory and measurement of diffusive photon transport.

MLA

Wu, K. C., et al. “Prediction of Ceramic Stereolithography Resin Sensitivity from Theory and Measurement of Diffusive Photon Transport.” Journal of Applied Physics, vol. 98, no. 2, July 2005, p. 024902. EBSCOhost, https://doi.org/10.1063/1.1980531.

APA

Wu, K. C., Seefeldt, K. F., Solomon, M. J., & Halloran, J. W. (2005). Prediction of ceramic stereolithography resin sensitivity from theory and measurement of diffusive photon transport. Journal of Applied Physics, 98(2), 024902. https://doi.org/10.1063/1.1980531

Chicago

Wu, K. C., K. F. Seefeldt, M. J. Solomon, and J. W. Halloran. 2005. “Prediction of Ceramic Stereolithography Resin Sensitivity from Theory and Measurement of Diffusive Photon Transport.” Journal of Applied Physics 98 (2): 024902. doi:10.1063/1.1980531.