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Prediction of ceramic stereolithography resin sensitivity from theory and measurement of diffusive photon transport.
- Source :
-
Journal of Applied Physics . 7/15/2005, Vol. 98 Issue 2, p024902. 10p. 1 Diagram, 1 Chart, 10 Graphs. - Publication Year :
- 2005
-
Abstract
- A general, quantitative relationship between the photon-transport mean free path (l*) and resin sensitivity (DP) in multiple-scattering alumina/monomer suspensions formulated for ceramic stereolithography is presented and experimentally demonstrated. A Mie-theory-based computational method with structure factor contributions to determine l* was developed. Planar-source diffuse transmittance experiments were performed on monodisperse and bimodal polystyrene/water and alumina/monomer systems to validate this computational tool. The experimental data support the application of this l* calculation method to concentrated suspensions composed of nonaggregating particles of moderately aspherical shape and log-normal size distribution. The values of DP are shown to be approximately five times that of l* in the tested ceramic stereolithography suspensions. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 98
- Issue :
- 2
- Database :
- Academic Search Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 17818330
- Full Text :
- https://doi.org/10.1063/1.1980531