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Innovative Waste Benzene Remediation by Enhanced Photocatalytic with TiO2/Fe3O4-Based Material Supported by Bentonite in Batch and Continuous System.

Authors :
Savitri, Emma
Yunita, Stefanie Wiyono
Winoto, Claudia
Widi, Restu Kartiko
Source :
Trends in Sciences. Jul2024, Vol. 21 Issue 7, p1-13. 13p.
Publication Year :
2024

Abstract

Photocatalytic degradation of benzene is a viable and environmentally friendly method with significant economic advantages. In this study, a composite photocatalyst consisting of TiO2 and Fe3O4 supported by bentonite was synthesized for benzene degradation. The objective was to assess the impact of critical parameters in both batch and continuous systems. The results showed that in batch system, the effects of initial benzene concentration and pH were explored, showing optimal degradation at an initial concentration of 400 ppm and pH 5. Under these conditions, an impressive % removal value of 95.334 % was achieved. Meanwhile, continuous system analysis showed a negative correlation between feed flow rate and % removal, with the most effective degradation occurring at a flow rate of 15 mL/min. The study also delivered into the kinetics of benzene degradation in batch system, obtaining a first-order reaction based on Langmuir-Hinshelwood model with a reaction rate constant (kr) of 85.68175 mg/(L.min) and an adsorption rate constant (K) of 0.0003002 L/mg. The adsorption model was observed to follow the Langmuir model. These results contributed to the optimization of photocatalytic benzene degradation processes, offering insights into the critical factors affecting efficiency in both batch and continuous systems. The established optimum conditions and kinetic parameters provided a foundation for future advancements in the design and application of composite photocatalysts for benzene remediation. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
27740226
Volume :
21
Issue :
7
Database :
Academic Search Index
Journal :
Trends in Sciences
Publication Type :
Academic Journal
Accession number :
177833780
Full Text :
https://doi.org/10.48048/tis.2024.7872