Cite
Titanium oxynitride thin films by the reactive sputtering process with an independent pulsing of O2 and N2 gases.
MLA
Martin, Nicolas, et al. “Titanium Oxynitride Thin Films by the Reactive Sputtering Process with an Independent Pulsing of O2 and N2 Gases.” Thin Solid Films, vol. 796, May 2024, p. N.PAG. EBSCOhost, https://doi.org/10.1016/j.tsf.2024.140340.
APA
Martin, N., Cote, J.-M., Gavoille, J., & Rauch, J.-Y. (2024). Titanium oxynitride thin films by the reactive sputtering process with an independent pulsing of O2 and N2 gases. Thin Solid Films, 796, N.PAG. https://doi.org/10.1016/j.tsf.2024.140340
Chicago
Martin, Nicolas, Jean-Marc Cote, Joseph Gavoille, and Jean-Yves Rauch. 2024. “Titanium Oxynitride Thin Films by the Reactive Sputtering Process with an Independent Pulsing of O2 and N2 Gases.” Thin Solid Films 796 (May): N.PAG. doi:10.1016/j.tsf.2024.140340.