Utilizing hydrolysis resistance of compressed Li3PS4 films to eradicate surface hydroxyls and form conformal coatings through atomic layer deposition.

MLA

Qiao, Ronghan, et al. “Utilizing Hydrolysis Resistance of Compressed Li3PS4 Films to Eradicate Surface Hydroxyls and Form Conformal Coatings through Atomic Layer Deposition.” Chemical Engineering Journal, vol. 486, Apr. 2024, p. N.PAG. EBSCOhost, https://doi.org/10.1016/j.cej.2024.149877.

APA

Qiao, R., Yu, H., Ben, L., Tian, M., Shen, X., Cen, G., Zhu, J., Wang, Q., Zhao, W., Zhang, J., & Huang, X. (2024). Utilizing hydrolysis resistance of compressed Li3PS4 films to eradicate surface hydroxyls and form conformal coatings through atomic layer deposition. Chemical Engineering Journal, 486, N.PAG. https://doi.org/10.1016/j.cej.2024.149877

Chicago

Qiao, Ronghan, Hailong Yu, Liubin Ben, Mengyu Tian, Xiaoyu Shen, Guanjun Cen, Jing Zhu, et al. 2024. “Utilizing Hydrolysis Resistance of Compressed Li3PS4 Films to Eradicate Surface Hydroxyls and Form Conformal Coatings through Atomic Layer Deposition.” Chemical Engineering Journal 486 (April): N.PAG. doi:10.1016/j.cej.2024.149877.