Back to Search Start Over

Mist Chemical Vapor Deposition Using Poorly Soluble Particles as Raw Material.

Authors :
Yamazaki, Yuki
Nakamura, Tsubasa
Kato, Kodai
Hara, Kazuhiko
Kouno, Tetsuya
Source :
Crystal Research & Technology. Jun2024, Vol. 59 Issue 6, p1-4. 4p.
Publication Year :
2024

Abstract

Mist chemical vapor deposition (mist‐CVD) is expected to be a potentially low‐environment‐impact and low‐cost crystal growth technique. With mist‐CVD, soluble materials are usually selected as raw materials, and mist is usually generated from an aqueous solution including raw materials. However, any substances to be included in the mist can be potentially supplied as raw materials. Namely, there is no need for the substances to be dissolved in some solvent. Therefore, as a trial, it is demonstrated that mist including poorly soluble particles are used as raw materials for mist‐CVD crystal growth. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
02321300
Volume :
59
Issue :
6
Database :
Academic Search Index
Journal :
Crystal Research & Technology
Publication Type :
Academic Journal
Accession number :
177677290
Full Text :
https://doi.org/10.1002/crat.202400011