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DUV optoelectronic bionic synapse based on the MOCVD-deposited amorphous gallium oxide film.

Authors :
Li, Zeming
Jiao, Teng
Li, Wancheng
Hu, Yifan
Dang, Xinming
Chang, Yuchun
Lu, Hongbin
Pan, Chong
Dong, Xin
Zhang, Baolin
Source :
Materials Letters. May2024, Vol. 363, pN.PAG-N.PAG. 1p.
Publication Year :
2024

Abstract

• The DUV optoelectronic synapse was fabricated on the MOCVD-deposited a-GaO x film. • The information written into the bionic synapse is non-volatile. • The synapse can mimic the transition from short-term memory to long-term memory. Optoelectronic bionic synapses, integrating sensing and processing capabilities, help to break through the limitations of von Neumann structure and are promising in smart sensors, AI robots etc. fields. Here, we fabricated a deep ultraviolet (DUV) optoelectronic bionic synapse with an amorphous gallium oxide (a-GaO x) film deposited by metal–organic chemical vapor deposition (MOCVD). DUV illumination pulses could be facilely written into the bionic synapse, and the written information exhibits non-volatility. By manipulating the illumination pulse number, the pulse width, and the pulse power density, the synapse is capable of transitioning from short-term memory (STM) to long-term memory (LTM), effectively emulating the learning-memory behavior of human brains. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
0167577X
Volume :
363
Database :
Academic Search Index
Journal :
Materials Letters
Publication Type :
Academic Journal
Accession number :
176247201
Full Text :
https://doi.org/10.1016/j.matlet.2024.136304