Back to Search
Start Over
A Label-Free Measurement Method for Plane Stress States in Optical Isotropic Films with Spectroscopic Ellipsometry.
- Source :
-
Experimental Mechanics . Apr2024, Vol. 64 Issue 3, p341-352. 12p. - Publication Year :
- 2024
-
Abstract
- Background: Stress measurement for thin films is crucial in a variety of fields such as in semiconductor manufacturing, the optoelectronics industry, and biomedical science, among others. However, most measurement methods require surface treatment of the thin film. Objective: A label-free measurement method for plane stress states in optical isotropic thin films based on spectroscopic ellipsometry analysis is proposed and verified in this paper. Methods: The proposed method is based on the modulation of the stress-optic effect on reflected spectroscopic ellipsometry. A theoretical model is established to describe the relation between all components of the plane-stress state and the classic ellipsometric parameters (Ψ, Δ). An algorithm is developed to determine all components of a plane-stress state by fitting the model to the experiment data. Results: In the verification experiment, we determined the plane stress state of a Cu film coated on a PI (polyimide) substrate. The results show a reasonable agreement between the experimental measurements from spectroscopic ellipsometry and the theoretical analysis based on the applied loading. Conclusion: The results prove that our method can effectively measure the plane stress state of optical isotropic thin films. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 00144851
- Volume :
- 64
- Issue :
- 3
- Database :
- Academic Search Index
- Journal :
- Experimental Mechanics
- Publication Type :
- Academic Journal
- Accession number :
- 176145114
- Full Text :
- https://doi.org/10.1007/s11340-023-01026-w