Cite
One-step amination of MWCNTs in RF-dielectric barrier discharge Ar–N2-H2 plasmas.
MLA
Abdel-Fattah, Essam, et al. “One-Step Amination of MWCNTs in RF-Dielectric Barrier Discharge Ar–N2-H2 Plasmas.” Vacuum, vol. 222, Apr. 2024, p. N.PAG. EBSCOhost, https://doi.org/10.1016/j.vacuum.2024.113002.
APA
Abdel-Fattah, E., Ogawa, D., & Nakamura, K. (2024). One-step amination of MWCNTs in RF-dielectric barrier discharge Ar–N2-H2 plasmas. Vacuum, 222, N.PAG. https://doi.org/10.1016/j.vacuum.2024.113002
Chicago
Abdel-Fattah, Essam, Daisuke Ogawa, and Keji Nakamura. 2024. “One-Step Amination of MWCNTs in RF-Dielectric Barrier Discharge Ar–N2-H2 Plasmas.” Vacuum 222 (April): N.PAG. doi:10.1016/j.vacuum.2024.113002.