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Erratum: "Understanding chemical and physical mechanisms in atomic layer deposition" [J. Chem. Phys. 152, 040902 (2020)].

Authors :
Richey, Nathaniel E.
de Paula, Camila
Bent, Stacey F.
Source :
Journal of Chemical Physics. 2/28/2024, Vol. 160 Issue 8, p1-1. 1p.
Publication Year :
2024

Abstract

This document is an erratum for a paper titled "Understanding chemical and physical mechanisms in atomic layer deposition" published in the Journal of Chemical Physics. The authors have requested a correction to Equation (18) of the original paper. The correction involves a change in the equation based on the definition of Hm from a reference. The erratum is authored by Nathaniel E. Richey, Camila de Paula, and Stacey F. Bent. [Extracted from the article]

Subjects

Subjects :
*ATOMIC layer deposition

Details

Language :
English
ISSN :
00219606
Volume :
160
Issue :
8
Database :
Academic Search Index
Journal :
Journal of Chemical Physics
Publication Type :
Academic Journal
Accession number :
175757157
Full Text :
https://doi.org/10.1063/5.0202455