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Erratum: "Understanding chemical and physical mechanisms in atomic layer deposition" [J. Chem. Phys. 152, 040902 (2020)].
- Source :
-
Journal of Chemical Physics . 2/28/2024, Vol. 160 Issue 8, p1-1. 1p. - Publication Year :
- 2024
-
Abstract
- This document is an erratum for a paper titled "Understanding chemical and physical mechanisms in atomic layer deposition" published in the Journal of Chemical Physics. The authors have requested a correction to Equation (18) of the original paper. The correction involves a change in the equation based on the definition of Hm from a reference. The erratum is authored by Nathaniel E. Richey, Camila de Paula, and Stacey F. Bent. [Extracted from the article]
- Subjects :
- *ATOMIC layer deposition
Subjects
Details
- Language :
- English
- ISSN :
- 00219606
- Volume :
- 160
- Issue :
- 8
- Database :
- Academic Search Index
- Journal :
- Journal of Chemical Physics
- Publication Type :
- Academic Journal
- Accession number :
- 175757157
- Full Text :
- https://doi.org/10.1063/5.0202455