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Polyethyleneimine-modified iron-doped birnessite as a highly stable adsorbent for efficient arsenic removal.

Authors :
Yu, Peng
Xing, Junying
Tang, Jing
Wang, Zhiguo
Zhang, Chun
Wang, Qiongchao
Xiao, Xinxin
Huang, Wei
Source :
Journal of Colloid & Interface Science. May2024, Vol. 661, p164-174. 11p.
Publication Year :
2024

Abstract

[Display omitted] Remediation of arsenic contamination is of great importance given the high toxicity and easy mobility of arsenic species in water and soil. This work reports a new and stable adsorbent for efficient elimination of arsenic by coating polyethyleneimine (PEI) molecules onto the surface of iron-doped birnessite (Fe-Bir). Characterization results of surface microstructure and crystalline feature (scanning electron microscopy (SEM), X-ray diffraction (XRD), Fourier transform infrared spectrometer (FTIR) and X-ray photoelectron spectroscopy (XPS), etc.) suggest that Fe-Bir/PEI possesses a fine particle structure, inhibiting the agglomeration of birnessite-typed MnO 2 and offering abundant active sites for arsenic adsorption. Fe-Bir/PEI is capable of working in a wide pH range from 3 to 11, with an efficient removal capacity of 53.86 mg/g at initial pH (pH 0) of 7. Meanwhile, commonly coexisting anions (NO3−, SO 4 2−, and Cl−) and cations (Na+, K+, Ca2+ and Mg2+) pose no effect on the arsenic removal performance of Bir/PEI. Fe-Bir/PEI exhibits a good reusability for arsenic removal with low Mn and Fe ions leaching after 5 cycles. Besides, Fe-Bir/PEI possesses efficient remediation capability in simulated As-contaminated soil. The modification of PEI in Fe-Bir/PEI can adsorb newly formed As(V), which is impossible for the adsorbent without PEI. Further, the arsenic removal mechanism of Fe-Bir/PEI is revealed with redox effect, electrostatic attraction and hydrogen bonding. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00219797
Volume :
661
Database :
Academic Search Index
Journal :
Journal of Colloid & Interface Science
Publication Type :
Academic Journal
Accession number :
175638848
Full Text :
https://doi.org/10.1016/j.jcis.2024.01.163