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A deep learning approach for balance optimisation of patch panel assembly line.

Authors :
Wang, Xinghe
Lin, Chaoquan
Yang, Shuo
Chen, Jiabin
Liu, Bihua
Chipusu, Kavimbi
Source :
Journal of Engineering Design. Feb2024, p1-19. 19p. 7 Illustrations, 5 Charts.
Publication Year :
2024

Abstract

This paper introduces an integrated methodology to enhance the efficiency of patch panel assembly lines by harnessing advanced artificial intelligence (AI) techniques. The primary objective is to minimise the total completion time of patch panels, a pivotal metric for manufacturing efficiency. The study employs the Assembly Line Production Optimisation (ALPO) model to analyze and enhance the production capacity of the bottleneck station. Existing challenges related to patch panel assembly line task distribution, process content, and tooling layout are scrutinised against production process standards for operational measurements. To achieve improvement, Deep Neural Network (DNN) and Recurrent Neural Network (RNN) models are employed in hidden layers, supplemented by deep feed-forward (DFF) layers for output, in adherence to engineering design principles. The bottleneck station's load rate is successfully reduced to below 80%, contributing to an overall balance rate increase from 73% to 88%. These outcomes signify a notable enhancement in production efficiency and employee satisfaction. The research utilises a dataset derived from the Microsoft Azure AI-based PdM dataset. The paper illustrates how AI techniques offer a comprehensive solution to address the inherent complexities in patch panel assembly line optimisation. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
09544828
Database :
Academic Search Index
Journal :
Journal of Engineering Design
Publication Type :
Academic Journal
Accession number :
175176101
Full Text :
https://doi.org/10.1080/09544828.2024.2309861