Microstructure and Properties of Thin Films of Zirconium Produced by High-Frequency Laser Deposition.

Nanostructured thin films on a silicon substrate were obtained by high-frequency periodic pulse f ~ 6–10 kHz action of laser radiation with wavelength λ = 1.064 μm and power density q = 120 MW/cm2 on zirconium in a vacuum chamber at pressure p = 2.2 Pa. The morphology of the thin films of zirconium was studied by atomic-force microscopy. The transmission spectra of the zirconium films in the visible and near and mid IR regions were obtained. The electrophysical characteristics of the Zr/Si structures were analyzed. [ABSTRACT FROM AUTHOR]