Anticorrosive and antimicrobial efficiency of photopolymerizable phosphorus (meth)acrylate oligomers-based coating materials.

Novel photopolymerizable phosphorus (meth)acrylate oligomers were verified as anticorrosive and antimicrobial coating materials. Oligomers containing P-atoms were prepared by a solution-free UV-initiated telomerization process of aliphatic (meth)acrylates and styrene in the presence of different organic phosphorus compounds (P-telogens). The influence of the P-telogen structure on the photoaging process of coatings, as well as their anticorrosion and antibacterial properties was investigated. Relatively the highest anticorrosive efficiency was revealed for a varnish based on a telomers syrup containing dibutyl phosphite (DBPh) and dibutyl phosphate (DBP) due to the relatively long alkyl chain. In turn, UV-photocurable coatings exhibited moderate antibacterial and good anti-yeast activity but the best properties were found for the coating with dimethyl phosphite (DMPh). The higher resistance to photodegradation was observed in the case of the diphenyl phosphite (DPPh) due to the large phenyl substituent. Regardless of the structure of the organophosphorus compound, all coatings showed excellent adhesion to the glass substrate. • A varnish binder prepared by a solvent-free UV-telomerization process • Liquid varnishes containing different organophosphorus compounds • Photo-cured varnish coatings with excellent adhesion, hardness, and anticorrosive properties • The coatings with moderate antibacterial and good anti-yeast activities [ABSTRACT FROM AUTHOR]