Effects of the burner on SiO2 formation and deposition in the OVD process.

The burner of outside vapor deposition (OVD) is of great significance for enhancing the yields and quality of the optical fiber preform. This study aims to numerically investigate the effects of the burner on silica particles formation and its corresponding deposition performance in the OVD process. This work is based on our recently developed integrated Eulerian-Eulerian multiphase OVD process model combined with a particle nucleation model. The effects of the distance between the burner and target, the horizontal offset of the target to the burner, the shape of burners, swirl burners as well as double burners are investigated. The results demonstrate that there exists an optimal value for the distance between the burner and target to yield the largest deposition efficiency. However, the deposition efficiency monotonically declines as the horizontal offset of the target to the burner increases. The elliptic burner potentially provides a better match with the target surface for particle deposition. An optimal number of helical vanes installed inside the O 2 –1 inlet is observed in the counter-swirling burner of O 2 –1 and H 2 inlets, which yields the largest deposition efficiency of 33.4%. Double burners could promote the deposition rate, but could not enhance the particle deposition efficiency. The results provide a deeper understanding of the burner design and OVD process optimization. [Display omitted] • Effects of burner on SiO 2 formation and deposition and OVD inner states are studied. • An optimal distance between the burner and target is identified. • Double burners promote deposition rate, but could not enhance deposition efficiency. [ABSTRACT FROM AUTHOR]