Flexible and low roughness cast films: promising candidates for capacitor applications.

MLA

Wang, Zunyu, et al. “Flexible and Low Roughness Cast Films: Promising Candidates for Capacitor Applications.” Journal of Materials Science, vol. 58, no. 42, Nov. 2023, pp. 16372–84. EBSCOhost, https://doi.org/10.1007/s10853-023-09016-y.

APA

Wang, Z., Zhang, X., Li, X., Wang, H., Lü, Z., Hu, H., & Wang, J. (2023). Flexible and low roughness cast films: promising candidates for capacitor applications. Journal of Materials Science, 58(42), 16372–16384. https://doi.org/10.1007/s10853-023-09016-y

Chicago

Wang, Zunyu, Xiuli Zhang, Xingjia Li, Huiping Wang, Zhaoyue Lü, Haiyang Hu, and Jing Wang. 2023. “Flexible and Low Roughness Cast Films: Promising Candidates for Capacitor Applications.” Journal of Materials Science 58 (42): 16372–84. doi:10.1007/s10853-023-09016-y.