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Boosting photocatalytic hydrogen peroxide production by regulating electronic configuration of single Sb atoms via carbon vacancies in carbon nitrides.

Authors :
He, Qinye
Ding, Jie
Tsai, Hsin-Jung
Liu, Yuhang
Wei, Min
Zhang, Qiao
Wei, Zhiming
Chen, Zhaoyang
Huang, Jian
Hung, Sung-Fu
Yang, Hongbin
Zhai, Yueming
Source :
Journal of Colloid & Interface Science. Dec2023, Vol. 651, p18-26. 9p.
Publication Year :
2023

Abstract

Single Sb atoms on carbon vacancy-rich C 3 N 4 (Cv-C 3 N 4) with an electron-rich state tend to efficiently transfer electrons to pauling-type absorbed O 2 and boost the photocatalytic oxygen reduction reaction to H 2 O 2. [Display omitted] Single-atom catalysts supported on semiconductors can serve as active sites for efficient oxygen reduction to hydrogen peroxide (H 2 O 2). However, researchers have long been puzzled by the lack of guidance on optimizing the performance of single-atom photocatalysts. In this study, we propose a versatile strategy that utilizes carbon vacancies to regulate the electronic configuration of antimony (Sb) atoms on carbon nitrides (C 3 N 4). This strategy has been found to significantly enhance the photocatalytic production of H 2 O 2. The H 2 O 2 evolution rate of Sb single-atom on carbon vacancy-rich C 3 N 4 (designated as Sb 1 /Cv-C 3 N 4) is 5.369 mmol g-1h−1, which is 10.9 times higher than C 3 N 4 alone. By combining experimental characterizations and density functional theory simulations, we reveal the strong electronic interaction between Sb atoms and carbon vacancy-rich C 3 N 4. This interaction is capable for maintaining the electron-rich state of Sb atoms, facilitating efficient electron transfer to pauling-type absorbed oxygen, and ultimately enhancing the formation of *OOH intermediates. This innovative defect-engineering approach can manipulate the electronic configuration of single-atom catalysts, providing a new avenue to boost the photocatalytic oxygen reduction reaction towards H 2 O 2 production. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00219797
Volume :
651
Database :
Academic Search Index
Journal :
Journal of Colloid & Interface Science
Publication Type :
Academic Journal
Accession number :
171992110
Full Text :
https://doi.org/10.1016/j.jcis.2023.07.168