The Influence of Ion Implantation on Internal Stresses of a Submicrocrystalline VT1-0 Alloy.

The fine structure of a submicrocrystalline (SMC) VT1-0 alloy is studied after its implantation with aluminum ions at the irradiation doses of 1·1017, 5·1017, and 10·1017 ion/cm2. A gradient structure is observed to form in the alloy in this state, which consists of five different layers: 1 – oxide layer, 2 – ion-doped layer, 3 – layer with refined grain structure, 4 – layer of residual implantation influence, 5 – layer with initial grain structure. It is shown that at all of the implantation doses used in the study there is no dislocation structure in layers 2 and 3, and the dislocations in layers 4 and 5 form a network substructure. The internal stresses in layers 2 and 3 represent an elastic component of long-range stresses, in layer 4 – long-range and shear stresses, and in layer 5 – shear stresses only. [ABSTRACT FROM AUTHOR]