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Cryogenic Operation of Third-Generation, 200-GHz Peak- fT, Silicon--Germanium Heterojunction Bipolar Transistors.

Authors :
Banerjee, Bhaskar
Venkataraman, Sunitha
Lu, Yuan
Liang, Qingqing
Lee, Chang-Ho
Nuttinck, Sebastien
Heo, Dekhyuon
Chen, Yi-Jan Emery
Cressler, John D.
Laskar, Joy
Freeman, Greg
Ahlgren, David C.
Source :
IEEE Transactions on Electron Devices. Apr2005, Vol. 52 Issue 4, p585-593. 9p.
Publication Year :
2005

Abstract

We present a comprehensive investigation of the cryogenic performance of third-generation silicon-germanium (SiGe) heterojunction bipolar transistor (HBT) technology. Measurements of the current-voltage (dc), small-signal ac, and broad-band noise characteristics of a 200-GHz SiGe HBT were made at 85 K, 120 K, 150 K, 200 K, and 300 K. These devices show excellent behavior down to 85 K, maintaining reasonable dc ideality, with a peak current gain of 3800, a peak cut-off frequency (fT) of 260 GHz, a peak fmax of 310 GHz, and a minimum noise figure (NFmin) of approximately 0.30 dB at a frequency of 14 GHz, in all cases representing significant improvements over their corresponding values at 300 K. These results demonstrate that aggressively scaled SiGe HBTs are inherently well suited for cryogenic electronics applications requiring extreme levels of transistor performance. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00189383
Volume :
52
Issue :
4
Database :
Academic Search Index
Journal :
IEEE Transactions on Electron Devices
Publication Type :
Academic Journal
Accession number :
16592059
Full Text :
https://doi.org/10.1109/TED.2005.845078