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Retraction: "Direct imaging of Si incorporation in GaAs masklessly grown on patterned Si substrates" [Appl. Phys. Lett. 58, 2090 (1991)].

Authors :
Grundmann, M.
Christen, J.
Bimberg, D.
Hashimoto, A.
Fukunaga, T.
Watanabe, N.
Source :
Applied Physics Letters. 6/19/2023, Vol. 122 Issue 25, p1-1. 1p.
Publication Year :
2023

Abstract

Retraction: "Direct imaging of Si incorporation in GaAs masklessly grown on patterned Si substrates" [Appl. Phys. The editor and publisher are retracting the referenced article[1] due to substantial overlap with a previous publication.[2] Specifically, Figs. Grundmannet al., " Direct imaging of Si incorporation in GaAs masklessley grown on patterned Si substrates", Appl. Phys. [Extracted from the article]

Details

Language :
English
ISSN :
00036951
Volume :
122
Issue :
25
Database :
Academic Search Index
Journal :
Applied Physics Letters
Publication Type :
Academic Journal
Accession number :
164486157
Full Text :
https://doi.org/10.1063/5.0146966