Atomic layer deposition of hafnium oxide on porous silicon to form a template for athermal SERS-active substrates.

MLA

Girel, K., et al. “Atomic Layer Deposition of Hafnium Oxide on Porous Silicon to Form a Template for Athermal SERS-Active Substrates.” Applied Physics A: Materials Science & Processing, vol. 129, no. 4, Apr. 2023, pp. 1–9. EBSCOhost, https://doi.org/10.1007/s00339-023-06592-3.

APA

Girel, K., Burko, A., Zavatski, S., Barysiuk, A., Litvinova, K., Eganova, E., Tarasov, A., Novikov, D., Dubkov, S., & Bandarenka, H. (2023). Atomic layer deposition of hafnium oxide on porous silicon to form a template for athermal SERS-active substrates. Applied Physics A: Materials Science & Processing, 129(4), 1–9. https://doi.org/10.1007/s00339-023-06592-3

Chicago

Girel, K., A. Burko, S. Zavatski, A. Barysiuk, K. Litvinova, E. Eganova, A. Tarasov, D. Novikov, S. Dubkov, and H. Bandarenka. 2023. “Atomic Layer Deposition of Hafnium Oxide on Porous Silicon to Form a Template for Athermal SERS-Active Substrates.” Applied Physics A: Materials Science & Processing 129 (4): 1–9. doi:10.1007/s00339-023-06592-3.