Optimization of the Formations Parameters of Hollow Channels in Glass by Direct Laser Writing and Selective Etching.

The method of two-stage formation of hollow channels in glass by direct laser writing and subsequent selective etching is profitably used in the manufacture of microfluidics devices. In the present work, the influence of the concentration of the etching solution, the velocity of the laser beam, and the energy of laser pulses on the etching rate, selectivity, and roughness of hollow channels in quartz glass were investigated. For hollow channels, an etching rate 300 μm/h can be achieved together with very high selectivity (680) by using a 1M NaOH solution. [ABSTRACT FROM AUTHOR]