Electronic, nanomechanical and smart reversible phase transition behaviours of sputtered titanium oxide-vanadium oxide composite thin films.

Crystalline vanadium oxide-titanium oxide (VO-TO) composite thin films of 197 nm are developed on quartz and silicon substrates by RF magnetron sputtering technique. A thorough structural investigation of deposited thin films is carried out by field emission scanning electron microscopy (FESEM), X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) techniques. Differential scanning calorimetry (DSC) and temperature-based sheet resistance measurement techniques reveals the Smart (i.e., reversible) phase transition behaviour of VO-TO films at about 45 °C. Further selective depth analysis by XPS on the VO-TO films shows the variation of the Ti doping amount along the thickness. The top region of VO-TO thin film possess lower Ti species, while beyond 50 nm thickness from the surface possess comparatively rich Ti species. This graded Ti species along the depth also results in the variation of nanomechanical properties along the depth as confirmed by nanoindentation. The simulation through the finite element approach is also carried out to depict the experimental results of nanoindentation. The nanohardness and modulus of the presently developed VO-TO composite film were measured as 6.7 GPa and 158.7 GPa, respectively at 50 nm depth. Beyond 50 nm, nanohardness and modulus were 5.6 GPa and 116.6 GPa, respectively. Further, finite element simulation predicted yield stress value of 3.52 GPa at 50 nm depth whereas higher yield stress of 4.68 GPa was predicted beyond 50 nm. [ABSTRACT FROM AUTHOR]